Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels...
Elmentve itt :
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Dokumentumtípus: | Cikk |
Megjelent: |
2017
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Sorozat: | MICROMACHINES
8 No. 7 |
Tárgyszavak: | |
doi: | 10.3390/mi8070219 |
mtmt: | 3257987 |
Online Access: | http://publicatio.bibl.u-szeged.hu/22828 |
Tartalmi kivonat: | In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam. |
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Terjedelem/Fizikai jellemzők: | Terjedelem: 9-Azonosító: 219 |
ISSN: | 2072-666X |