Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels...
Elmentve itt :
| Szerzők: | |
|---|---|
| Dokumentumtípus: | Cikk |
| Megjelent: |
2017
|
| Sorozat: | MICROMACHINES
8 No. 7 |
| Tárgyszavak: | |
| doi: | 10.3390/mi8070219 |
| mtmt: | 3257987 |
| Online Access: | http://publicatio.bibl.u-szeged.hu/22828 |
| LEADER | 02135nab a2200277 i 4500 | ||
|---|---|---|---|
| 001 | publ22828 | ||
| 005 | 20221028122622.0 | ||
| 008 | 211108s2017 hu o 0|| Angol d | ||
| 022 | |a 2072-666X | ||
| 024 | 7 | |a 10.3390/mi8070219 |2 doi | |
| 024 | 7 | |a 3257987 |2 mtmt | |
| 040 | |a SZTE Publicatio Repozitórium |b hun | ||
| 041 | |a Angol | ||
| 100 | 1 | |a Horváth Bence | |
| 245 | 1 | 0 | |a Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers |h [elektronikus dokumentum] / |c Horváth Bence |
| 260 | |c 2017 | ||
| 300 | |a Terjedelem: 9-Azonosító: 219 | ||
| 490 | 0 | |a MICROMACHINES |v 8 No. 7 | |
| 520 | 3 | |a In the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam. | |
| 650 | 4 | |a Egyéb műszaki tudományok és technológiák | |
| 650 | 4 | |a Villamosmérnöki és informatikai tudományok | |
| 650 | 4 | |a Gépészmérnöki tudományok | |
| 650 | 4 | |a Nanotechnológia | |
| 700 | 0 | 1 | |a Ormos Pál |e aut |
| 700 | 0 | 1 | |a Kelemen Lóránd |e aut |
| 856 | 4 | 0 | |u http://publicatio.bibl.u-szeged.hu/22828/1/Cikk_Micromachines.pdf |z Dokumentum-elérés |