Comparative study on grating fabrication in transparent materials by TWIN-LIBWE and ultrashort pulsed ablation techniques

Two methods for micro-structuring of transparent dielectric were compared in this study: the two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE) and the two beam in-terferometric ablation by ultrashort laser pulses. In TWIN-LIBWE we used the 4th harmonic of Nd:YAG laser (λ=266 n...

Teljes leírás

Elmentve itt :
Bibliográfiai részletek
Szerzők: Vass Csaba
Kiss Bálint
Flender Roland
Felházi Zoltán
Lorenz Pierre
Erhardt Martin
Zimmer Klaus
Dokumentumtípus: Cikk
Megjelent: 2015
Sorozat:JOURNAL OF LASER MICRO NANOENGINEERING 10 No. 1
doi:10.2961/jlmn.2015.01.0008

mtmt:2854483
Online Access:http://publicatio.bibl.u-szeged.hu/7938
Leíró adatok
Tartalmi kivonat:Two methods for micro-structuring of transparent dielectric were compared in this study: the two-beam interferometric laser-induced backside wet etching (TWIN-LIBWE) and the two beam in-terferometric ablation by ultrashort laser pulses. In TWIN-LIBWE we used the 4th harmonic of Nd:YAG laser (λ=266 nm, τFWHM=8 ns, fuence: 265-500 mJ/cm2), while a Ti:Sapphire-based femto-second system (λ=800 nm, τFWHM=30 fs, pulse energy: 600-900 μJ) was used for direct ablation. Fused silica, sapphire and glass were used as bulk targets, while Al2O3, Y2O3, HfO2 and ZrO2 thin films (thickness: 160-1000 nm) on fused silica substrates were used as transparent film targets. The incident angle of the interfering beams was adjusted to result in 1 μm period structures in both ar-rangements. The surface morphologies of gratings were studied by atomic force microscope (AFM). After the comparison of best quality gratings produced by both setup in each material, we cannot determined which is the universally optimal method. The grating quality depends on the target ma-terial, their thickness, and certainly on the laser parameter.
Terjedelem/Fizikai jellemzők:38-42
ISSN:1880-0688